Elsene, Belgium

Jean Paul Gueneau De Mussy


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 60(Granted Patents)


Company Filing History:


Years Active: 2006-2008

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3 patents (USPTO):

Title: Innovations of Jean Paul Gueneau De Mussy

Introduction

Jean Paul Gueneau De Mussy is a notable inventor based in Elsene, Belgium. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative methods and devices.

Latest Patents

His latest patents include methods for selective integration of airgaps and devices made by such methods. These patents detail the production of airgaps in semiconductor devices, highlighting a semiconductor device that features a damascene stack formed using these methods. The damascene stack consists of a patterned dielectric layer that includes an interconnect structure, where the dielectric layer is composed of silicon, carbon, and oxygen. Additionally, the stack includes a converted portion of the dielectric layer, which has a lower carbon content than the original dielectric material. An airgap is formed adjacent to the interconnect structure by removing part of the converted portion using an etch compound. Another patent describes a method for producing airgaps in a semiconductor device, achieved by locally changing the properties of a first dielectric layer to make it etchable. This process can involve anisotropic etching in oxygen-containing plasma or an oxidizing step, such as UV/ozone treatment.

Career Highlights

Jean Paul Gueneau De Mussy has worked with the Interuniversity Microelectronics Centre (imec), a leading research institution in microelectronics. His work at imec has allowed him to contribute to advancements in semiconductor technology and innovation.

Collaborations

He has collaborated with notable colleagues, including Gerald Beyer and Karen Irma Maex, further enhancing the impact of his work in the field.

Conclusion

Jean Paul Gueneau De Mussy's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence advancements in the field of microelectronics.

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