Pelissanne, France

Jean-Marie Malterre

This inventor holds 1 USPTO granted patent. Top assignees: Etat Francais, Thomson-Csf. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jean-Marie Malterre. Retrieved from https://idiyas.com/inventor/jean-marie-malterre

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jean-Marie Malterre

Introduction

Jean-Marie Malterre is a notable inventor based in Pelissanne, France. He is recognized for his contributions to the field of simulation technology, particularly in enhancing the visual environment for pilots. His innovative approach has led to the development of a unique system that significantly improves pilot training experiences.

Latest Patents

Malterre holds a patent for a "System for restoring the visual environment of a pilot in a simulator." This disclosed system comprises a small diameter sphere that serves as a projection screen, within which the pilot is placed. The sphere is equipped with both external and internal generators, creating a more immersive training environment for pilots.

Career Highlights

Throughout his career, Jean-Marie Malterre has worked with prominent companies, including Thomson-CSF and Etat Francais. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in simulation technology.

Collaborations

One of his notable collaborators is Michel Henique. Their partnership has likely fostered innovative ideas and solutions in their respective fields.

Conclusion

Jean-Marie Malterre's work exemplifies the impact of innovation in pilot training technology. His patent and career achievements highlight his dedication to improving the aviation industry through advanced simulation systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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