Jean-Marie Foray

Title: The Innovative Contributions of Jean-Marie Foray

Introduction

Jean-Marie Foray is a notable inventor based in Annecy, France. He has made significant contributions to the field of photomask manufacturing, showcasing his expertise through his innovative patent.

Latest Patents

Jean-Marie Foray holds a patent titled "Method for manufacturing photomasks and device for its implementation." This inventive method includes at least one step of cleaning the photomask and placing a protective pellicle onto the photomask at the end of the manufacturing process. Additionally, the method incorporates a crucial step of removing ammonia and sulfate residue between the cleaning and pellicle placement steps. The device designed for this method features a sealed chamber containing at least one photomask, a pumping unit for maintaining a vacuum, a system for holding the photomask, infrared radiation means, and a gas injection system. He has 1 patent to his name.

Career Highlights

Throughout his career, Jean-Marie Foray has worked with prominent companies such as Alcatel Lucent and Adixen Vacuum Products. His experience in these organizations has contributed to his development as an inventor and innovator in the field.

Collaborations

Jean-Marie has collaborated with talented individuals, including Arnaud Favre and Magali Davenet. These partnerships have likely enriched his work and led to further advancements in his projects.

Conclusion

Jean-Marie Foray's contributions to photomask manufacturing through his innovative patent demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the industry and inspire future innovations.