Ependes, Switzerland

Jean-Luc Viret

This inventor holds 2 USPTO granted patents. Top assignee: Tesa Sarl. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jean-Luc Viret. Retrieved from https://idiyas.com/inventor/jean-luc-viret

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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2 patents (USPTO):Explore Patents

Title: Innovations by Jean-Luc Viret

Introduction

Jean-Luc Viret is a notable inventor based in Ependes, Switzerland. He has made significant contributions to the field of coordinate measuring systems, particularly through his innovative patents. With a total of 2 patents, Viret continues to push the boundaries of technology in his area of expertise.

Latest Patents

Viret's latest patents include a tool rack designed for coordinate measuring machines (CMM) and an articulating head for optical probes. The articulating probe head comprises an optical fiber and an interface for automatic connection to an optical coordinate probe. Additionally, the tool rack serves the purpose of storing tactile and/or optical probes for automatic exchange on the probe head. Viret has also described two methods to verify the quality of the optical waveguide from the controller to the probe tip.

Career Highlights

Jean-Luc Viret is associated with Tesa Sarl, where he applies his expertise in developing advanced measuring technologies. His work has been instrumental in enhancing the efficiency and accuracy of coordinate measuring systems.

Collaborations

Viret collaborates with talented individuals such as Julien Chardonnens and Léonard Wunderlin, contributing to a dynamic work environment that fosters innovation.

Conclusion

Jean-Luc Viret's contributions to the field of coordinate measuring systems exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of technology and its applications in precision measurement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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