Lyon, France

Jean-Louis Duran

This inventor holds 1 USPTO granted patent. Top assignee: Societe Nationale Elf Aquitaine. Active years: 1977.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jean-Louis Duran. Retrieved from https://idiyas.com/inventor/jean-louis-duran

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Jean-Louis Duran

Introduction

Jean-Louis Duran is a notable inventor based in Lyon, France. He has made significant contributions to the field of gas separation technology. His innovative methods have the potential to enhance efficiency in various industrial applications.

Latest Patents

Jean-Louis Duran holds a patent for a method of separating the constituents of a gas mixture. This method involves a two-step process. In the first step, the gas mixture is injected into a column that is swept by a continuous stream of carrier gas. This column contains a suitable selective solid adsorbent until it becomes saturated with the adsorbed constituent of the gas mixture. In the second step, small quantities of the mixture are periodically injected to collect fractions enriched in both the non-adsorbed and adsorbed constituents.

Career Highlights

Duran is associated with Société Nationale Elf Aquitaine, where he applies his expertise in gas separation technologies. His work has contributed to advancements in the efficiency of gas processing.

Collaborations

Throughout his career, Jean-Louis Duran has collaborated with notable colleagues such as Patrick Valentin and Germain Hagenbach. These collaborations have fostered innovation and development in their respective fields.

Conclusion

Jean-Louis Duran's contributions to gas separation technology exemplify the impact of innovative thinking in industrial applications. His patent reflects a commitment to enhancing efficiency and effectiveness in gas processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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