Paris, France

Jean L Pastre


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Jean L Pastre

Introduction

Jean L Pastre is a notable inventor based in Paris, France. He has made significant contributions to the field of aviation technology, particularly in the design of support devices for pilots. His innovative approach has led to advancements that enhance the safety and comfort of pilots during flight.

Latest Patents

Jean L Pastre holds a patent for a support device controlled in dependence on the movement of a helmet. This device is designed to carry the optical and electronic equipment typically used by an aircraft pilot. The support element is strategically placed at a distance from the helmet, which alleviates the load on the pilot's head. The system includes a detection assembly, a computer for error determination, a control circuit for generating error signals, and a set of jacks that adjust the position of the support element to eliminate any positioning errors. This innovative design significantly improves the pilot's experience and operational efficiency.

Career Highlights

Throughout his career, Jean L Pastre has been associated with Thomson-CSF, a prominent company in the field of defense and aerospace technology. His work has been instrumental in developing advanced systems that support pilots in various aviation scenarios. His dedication to innovation has earned him recognition in the industry.

Collaborations

Jean L Pastre has collaborated with various professionals in his field, including his coworker Guy Le Parquier. Their combined expertise has contributed to the successful development of cutting-edge technologies in aviation.

Conclusion

Jean L Pastre's contributions to aviation technology through his innovative patent and collaboration with industry professionals highlight his significant impact on pilot safety and comfort. His work continues to inspire advancements in the field.

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