Cran-Gevrier, France

Jean-François Daviet


Average Co-Inventor Count = 1.3

ph-index = 3

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2001-2003

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3 patents (USPTO):Explore Patents

Title: Innovations of Jean-François Daviet

Introduction

Jean-François Daviet is a notable inventor based in Cran-Gevrier, France. He has made significant contributions to the field of plasma processing, holding a total of three patents. His work focuses on enhancing the efficiency and control of plasma reactors used in semiconductor substrate processing.

Latest Patents

One of his latest patents is titled "Thin film electrostatic shield for inductive plasma processing." This invention describes a plasma reactor and methods for processing semiconductor substrates. The reactor utilizes an induction coil to couple power and produce plasma. A thin electrostatic shield is placed between the induction coil and the plasma to minimize capacitive coupling. This design allows inductive power to pass through while significantly reducing modulation of the plasma potential, leading to more controllable processing.

Another significant patent is the "Method and apparatus to produce large inductive plasma for plasma processing." This apparatus features a processing chamber with openings for receiving field energy through inductive coupling. It includes a field energy source that induces energy into the chamber via these openings. The source comprises an inductor device associated with a magnetic core, which serves as a closure and gas seal for the openings.

Career Highlights

Throughout his career, Jean-François Daviet has worked with various organizations, including CTP GmbH and the European Community. His expertise in plasma processing has made him a valuable asset in the field of semiconductor technology.

Collaborations

He has collaborated with notable colleagues such as Pascal Colpo and François Rossi, contributing to advancements in plasma processing technologies.

Conclusion

Jean-François Daviet's innovative work in plasma processing and his patents demonstrate his significant impact on the field. His contributions continue to influence the development of more efficient semiconductor processing techniques.

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