This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Centre National De La Recherche Scientifique. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Jean Etourneau: Innovator in Particle Coating Technology
Introduction
Jean Etourneau is a notable inventor based in Cestas, France. He has made significant contributions to the field of material science, particularly in the area of particle coating technology. His innovative approach has led to the development of a unique method for coating particles, which has potential applications in various industries.
Latest Patents
Jean Etourneau holds a patent for a "Method for coating particles." This invention relates to a method for coating particles that are brought into contact with at least one organo-metallic complex precursor of the coating material. The process involves maintaining the particles in a dispersion within a liquid subjected to specific temperature and pressure conditions. The precursor is transformed to deposit onto the particles, and the solvent is subsequently eliminated in a gaseous state. This method is particularly useful for coating nanometric particles.
Career Highlights
Jean Etourneau is affiliated with the Centre National de la Recherche Scientifique, a prestigious research institution in France. His work has been instrumental in advancing the understanding and application of particle coating techniques. With a focus on innovative solutions, he continues to contribute to the scientific community.
Collaborations
Some of his notable coworkers include Vincent Pessey and François Cansell. Their collaborative efforts have further enhanced the research and development of advanced coating methods.
Conclusion
Jean Etourneau's contributions to particle coating technology exemplify the spirit of innovation in material science. His patented method showcases the potential for advancements in various applications, particularly in the field of nanotechnology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
