Company Filing History:
Years Active: 2008-2009
Title: Jea Sik Lee: Innovator in Carbon Polymer Film Technology
Introduction
Jea Sik Lee is a notable inventor based in Tama, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for forming carbon polymer films. With a total of 2 patents to his name, Lee's work is recognized for its innovative approach and practical applications.
Latest Patents
Lee's latest patents focus on a method of forming a hydrocarbon-containing polymer film using plasma chemical vapor deposition (CVD). This method involves vaporizing a hydrocarbon-containing liquid monomer, which is then introduced into a CVD reaction chamber where a substrate is placed. The process allows for the formation of a hydrocarbon-containing polymer film on the substrate through plasma polymerization of the gas. This technology is crucial for enhancing the performance of semiconductor devices.
Career Highlights
Jea Sik Lee is currently employed at Asm Japan K.K., where he continues to push the boundaries of innovation in semiconductor technology. His expertise in plasma CVD processes has positioned him as a key player in the industry.
Collaborations
Lee has worked alongside notable colleagues such as Nobuo Matsuki and Yoshinori Morisada, contributing to a collaborative environment that fosters innovation and technological advancement.
Conclusion
Jea Sik Lee's contributions to the field of carbon polymer film technology exemplify the impact of innovative thinking in semiconductor applications. His patents and ongoing work at Asm Japan K.K. highlight the importance of advancements in this critical area of technology.