Uijeongbu-si, South Korea

Je Hee Lee

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Je Hee Lee. Retrieved from https://idiyas.com/inventor/je-hee-lee-9qxv7zlp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Je Hee Lee

Introduction

Je Hee Lee is a notable inventor based in Uijeongbu-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing. His work focuses on enhancing the efficiency and cleanliness of semiconductor production processes.

Latest Patents

Je Hee Lee holds 1 patent for a substrate transfer module and semiconductor manufacturing equipment. This innovative module is designed to provide a clean environment that prevents particles from contaminating the substrate. The substrate transfer module includes a transfer chamber that creates a transfer space for the substrate. It features a chamber groove that is lowered from the bottom surface to form a gap, along with a guide member inside the transfer chamber. Additionally, a substrate transfer robot is configured to move along the guide member to facilitate the transfer of the substrate.

Career Highlights

Je Hee Lee is currently employed at Semes Co., Ltd., where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in creating efficient manufacturing solutions has positioned him as a valuable asset in the industry.

Collaborations

Je Hee Lee collaborates with Duk Hyun Son, contributing to advancements in semiconductor technology. Their partnership enhances the innovative capabilities of their projects.

Conclusion

Je Hee Lee's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to improving production processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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