Singapore, Singapore

Jaya Chandran

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ultra Clean Holdings, Inc.. Active years: 2024.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Jaya Chandran: Innovator in Leak Detection Technology

Introduction

Jaya Chandran is a prominent inventor based in Singapore, known for her innovative contributions to leak detection technology. With a focus on enhancing the reliability of testing methods, she has developed a unique approach that addresses critical challenges in the industry.

Latest Patents

Jaya holds a patent for a method of sensing leaks in a unit under test. This method involves scanning a SKU on the unit, sending the SKU information to a computer, and connecting the unit to a testing apparatus. The process includes removing gas from the unit's interior volume, monitoring vacuum pressure, and initiating helium delivery through a helium gun. The helium is released over a weld, and the movement speed of the helium supply gun is detected. Finally, the helium content within the unit is displayed on a graphical user interface. This innovative approach significantly improves the accuracy and efficiency of leak detection.

Career Highlights

Jaya is currently employed at Ultra Clean Holdings, Inc., where she continues to develop and refine her inventions. Her work has garnered attention for its practical applications in various industries, making her a valuable asset to her company.

Collaborations

Jaya collaborates with talented coworkers, including Gethin Mao and Kevin Shi, who contribute to her projects and enhance the overall innovation process.

Conclusion

Jaya Chandran's contributions to leak detection technology exemplify her commitment to innovation and excellence. Her patent and ongoing work at Ultra Clean Holdings, Inc. highlight her role as a leading inventor in her field.

Profile summary based on public USPTO records.
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