Jay Sheth

Title: The Innovative Contributions of Jay Sheth

Introduction

Jay Sheth is a notable inventor based in San Jose, California. He has made significant contributions to the field of plasma processing systems, particularly through his innovative patent. His work is recognized for its potential to enhance etching processes in various applications.

Latest Patents

Jay Sheth holds a patent titled "Multiple state pulsing for high aspect ratio etch." This patent describes a method for performing an etch process on a substrate by applying a bias signal and a source signal to an electrode of a plasma processing system. The bias and source signals are pulsed RF signals that define a repeated pulsed RF cycle. Each cycle includes four distinct states, with varying power levels for both signals, optimizing the etching process.

Career Highlights

Sheth is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to focus on advancing etching technologies, contributing to the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Some of his coworkers include Aniruddha Joi and Nikhil Dole, who collaborate with him on various projects within the company. Their teamwork fosters an environment of innovation and shared expertise.

Conclusion

Jay Sheth's contributions to the field of plasma processing and etching technology exemplify the impact of innovative thinking in the semiconductor industry. His patent reflects a significant advancement that could influence future developments in the field.