CORNING, NY, United States of America

Jay Katsuhiko Stearns

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Corning Incorporated. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jay Katsuhiko Stearns. Retrieved from https://idiyas.com/inventor/jay-katsuhiko-stearns

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Biography of Jay Katsuhiko Stearns

Introduction: Jay Katsuhiko Stearns is an accomplished inventor based in Corning, NY. He is known for his innovative contributions to the field of measurement technology, particularly in the inspection of workpieces.

Latest Patents: Stearns holds a patent for a "Method and apparatus for high resolution measurement of a workpiece." This patent describes methods and systems for inspecting a workpiece, such as a honeycomb body. The process involves collecting multiple images of the honeycomb body, extracting measurement data from each image, converting the data into a common frame of reference, and combining the data for comprehensive analysis.

Career Highlights: Stearns has made significant strides in his career, working with Corning Incorporated, a leading company in materials science and technology. His work has contributed to advancements in high-resolution measurement techniques.

Collaborations: Throughout his career, Stearns has collaborated with notable colleagues, including Jeffrey Thomas Drake and Russell Wayne Madara. These collaborations have further enhanced the innovative solutions developed in his field.

Conclusion: Jay Katsuhiko Stearns exemplifies the spirit of innovation through his work and patents. His contributions to measurement technology continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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