This inventor holds 2 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 1997-1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1997-1999
Title: Innovations by Jau-Hwang Ho in Semiconductor Technology
Introduction
Jau-Hwang Ho is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of ultra-large scale integration (ULSI) devices. With a total of 2 patents, his work has advanced the capabilities of semiconductor fabrication processes.
Latest Patents
One of his latest patents is titled "Small contacts for ultra large scale integration semiconductor devices." This invention presents a method for fabricating very narrow contacts on semiconductor substrates, which increases the packing density of devices on ULSI circuits. The method utilizes conventional photolithographic techniques and anisotropic plasma etching to create openings in a conducting layer, partially etching into an underlying planar insulating layer that isolates the devices. A conformal conducting layer is then deposited, and the process continues to form sidewall spacers, ultimately allowing for very narrow contact openings to the desired device contact areas.
Another notable patent is "Reduced notching of polycide gates using silicon anti-reflection layer." This method enhances the fabrication of MOSFET devices with narrow gate structures and spaces between them. By incorporating a rough surfaced silicon layer into the gate structure, the invention minimizes reflective and scattered light during photolithographic processing. This innovation significantly improves the ability to achieve sub-micron lines and spaces, which is crucial for modern semiconductor devices.
Career Highlights
Jau-Hwang Ho is affiliated with the Industrial Technology Research Institute, where he continues to push the boundaries of semiconductor technology. His work has not only contributed to the advancement of ULSI devices but has also set new standards in the fabrication processes used in the industry.
Collaborations
Throughout his career, Jau-Hwang Ho has collaborated with notable colleagues, including Chang-Ming Dai and Meng-Jaw Cherng. These collaborations have further enriched his research and development efforts in semiconductor technology.
Conclusion
Jau-Hwang Ho's innovative patents and contributions to semiconductor technology highlight his role as a leading inventor in the field. His work continues to influence the development of advanced semiconductor devices, paving the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
