Shanghai, China

Jason Wang

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Wacker Chemie Ag. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Wang. Retrieved from https://idiyas.com/inventor/jason-wang-wqrnxutd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Jason Wang - Innovator in Optoelectronic Display Technology

Introduction

Jason Wang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optoelectronic display devices. His innovative work has led to the development of a unique lamination method for substrates, which is crucial for enhancing the performance of display technologies.

Latest Patents

Jason Wang holds 1 patent for his invention titled "Lamination method of substrates and product prepared thereby." This patent focuses on the preparation of substrates suitable for optoelectronic display devices, showcasing his expertise in this cutting-edge technology.

Career Highlights

Wang is currently employed at Wacker Chemie AG, a leading company in the chemical industry. His role at Wacker Chemie AG allows him to work on advanced materials that are essential for modern display technologies. His contributions have been instrumental in pushing the boundaries of what is possible in optoelectronics.

Collaborations

Throughout his career, Jason has collaborated with talented individuals such as Jungeun Lee and SeungA Lee. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Jason Wang is a key figure in the development of optoelectronic display technologies. His patent and work at Wacker Chemie AG highlight his commitment to innovation in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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