Jason Regis

Title: Jason Regis - Innovator in Oxide Plasma Etching Technology

Introduction

Jason Regis is a notable inventor based in Amesbury, MA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to oxide plasma etching processes.

Latest Patents

Jason Regis holds a patent for an "Oxide plasma etching process with a controlled wineglass shape." This method is particularly applicable for forming through an oxide layer a wineglass-shaped contact or via hole of controlled shape. The wineglass hole is especially useful for eased metal hole filling. The process involves first etching an anisotropic hole through a mask aperture, followed by isotropically etching through the same mask aperture. The relative periods of the anisotropic and isotropic etch determine the lateral-to-vertical dimensions of the bowl. The stem is then etched through the same mask aperture with a strongly anisotropic etch. Notably, the isotropic etch may be performed in the same chamber as the anisotropic etch or in a separate etch chamber with a remote plasma source. Jason has 1 patent to his name.

Career Highlights

Jason Regis is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing etching technologies that are crucial for the fabrication of integrated circuits.

Collaborations

Throughout his career, Jason has collaborated with several talented individuals, including James A. Stinnett and Cynthia B. Brooks. These collaborations have contributed to the development of innovative solutions in the field of semiconductor manufacturing.

Conclusion

Jason Regis is a prominent figure in the field of oxide plasma etching technology, with a patented process that enhances semiconductor manufacturing. His contributions continue to influence the industry and pave the way for future innovations.