Jason R Beringer

Title: **Jason R. Beringer: Innovator in Ion Implantation Technology**

Introduction

Jason R. Beringer, based in Danvers, Massachusetts, is a remarkable inventor specializing in ion implantation technology. With a total of three patents to his name, his contributions are significantly advancing the field. His work focuses on innovative approaches to generating and applying aluminum ions in various industrial applications.

Latest Patents

Among his latest patents, Beringer has developed an advanced ion implantation system that utilizes solid aluminum iodide (ALI3) for the production of atomic aluminum ions. This system boasts a unique ion source that forms an ion beam from aluminum iodide, coupled with a beamline assembly designed to transport the ion beam effectively to an end station for implantation into workpieces. The ion source comprises a solid-state material source of aluminum iodide and employs a solid source vaporizer to create gaseous aluminum iodide. A plasma is subsequently formed in an arc chamber, where aluminum ions are dissociated from the aluminum iodide. A water vapor source is also integrated to react residual aluminum iodide, successfully converting it to hydroiodic acid, which is then evacuated from the system.

Another significant patent from Beringer is the cam actuated filament clamp, which features a sophisticated clamp member with an actuator pin that operates between clamped and unclamped positions. This innovative design allows for precise control over the clamping pressure exerted on the lead of an ion source filament, demonstrating Beringer's focus on enhancing the efficiency and reliability of ion sources.

Career Highlights

Jason R. Beringer currently works at Axcelis Technologies, Inc., a leader in engineering equipment for the semiconductor sector. His role at the company allows him to further develop his innovative ideas and contribute to various ion implantation technologies, helping to advance the capabilities and applications of these systems in the industry.

Collaborations

Throughout his career, Beringer has collaborated with talented engineers and inventors, including Dennis Elliott Kamenitsa and Richard Rzeszut. These partnerships have been instrumental in refining his inventions and expanding the technological advancements within ion implantation.

Conclusion

With a robust portfolio of patents and innovative projects, Jason R. Beringer is a prominent figure in the realm of ion implantation technology. His latest contributions not only highlight his expertise but also pave the way for advancements that can significantly impact the semiconductor industry and beyond. Beringer's work exemplifies the essence of innovation, making him a valuable asset to Axcelis Technologies and the broader tech community.