Jason Q Niu

Title: Innovations of Jason Q Niu in Semiconductor Technology

Introduction

Jason Q Niu is a notable inventor based in Midland, MI (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Niu's work focuses on the development of advanced materials and methods for semiconductor devices.

Latest Patents

Niu's latest patents include "Sacrificial benzocyclobutene/norbornene polymers for making air gap semiconductor devices." This patent describes a method of forming an air gap within a semiconductor structure by using a sacrificial polymer. The process involves heating the semiconductor structure to decompose the sacrificial polymer, leaving an air gap. The sacrificial polymer can be a copolymer of 5-ethylidene-2-norbornene and vinylbenzocyclobutene or other derivatives. Another significant patent is "Sacrificial benzocyclobutene copolymers for making air gap semiconductor devices." This patent outlines a similar method, utilizing a copolymer of bis[3-(4-benzocyclobutenyl)]1,n alkyldiol diacrylate and 1,3 bis 2[4-benzocyclobutenyl(ethenyl)]benzene.

Career Highlights

Jason Q Niu is currently employed at Dow Global Technologies LLC, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing the technology used in semiconductor devices, contributing to the efficiency and effectiveness of these essential components.

Collaborations

Niu has collaborated with notable colleagues, including Robert A Kirchhoff and Kenneth L Foster. These partnerships have fostered a collaborative environment that enhances the innovation process and leads to groundbreaking advancements in semiconductor technology.

Conclusion

Jason Q Niu's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to shape the future of semiconductor devices.