Jason Paul Hadorn

Title: Jason Paul Hadorn: Innovator in Perpendicularly Magnetized Film Structures

Introduction

Jason Paul Hadorn is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of perpendicularly magnetized film structures. With a total of 2 patents to his name, Hadorn's work is recognized for its innovative approach to magnetic materials.

Latest Patents

Hadorn's latest patents include advancements in underlayers for perpendicularly magnetized films and the structures that utilize them. One of his key inventions is a perpendicularly magnetized film structure that employs a highly heat-resistant underlayer film. This underlayer allows for the growth of cubic or tetragonal perpendicularly magnetized films with high quality. The structure consists of a substrate made from a cubic single crystal with a (001) plane, along with an underlayer formed from a thin film of metal with an hcp structure. The perpendicularly magnetized layer is created from cubic materials such as Co-based Heusler alloys and cobalt-iron (CoFe) alloys.

Career Highlights

Jason Paul Hadorn is currently affiliated with the National Institute for Materials Science. His work at this institution has allowed him to explore and innovate in the field of magnetic materials, contributing to advancements that have potential applications in data storage and other technologies.

Collaborations

Hadorn has collaborated with esteemed colleagues such as Hiroaki Sukegawa and Zhenchao Wen. These collaborations have further enriched his research and development efforts in the field of materials science.

Conclusion

In summary, Jason Paul Hadorn is a prominent inventor whose work in perpendicularly magnetized film structures has made a significant impact in materials science. His innovative patents and collaborations highlight his dedication to advancing technology in this field.