Cambridgeshire, United Kingdom

Jason Palmer

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Jemella Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Palmer. Retrieved from https://idiyas.com/inventor/jason-palmer-3ff6f26b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Jason Palmer - Innovator in Hair Styling Technology

Introduction

Jason Palmer is a notable inventor based in Cambridgeshire, GB. He has made significant contributions to the field of hair styling with his innovative designs. His work reflects a commitment to enhancing user experience through practical inventions.

Latest Patents

Jason Palmer holds a patent for a hair styling device. This device features a shoulder assembly designed to connect two arms of a hair styling apparatus. The shoulder assembly includes a housing, a first coupling member, and a second coupling member. Both coupling members are flexible, allowing for movement between the first and second arms when connected.

Career Highlights

Palmer is associated with Jemella Limited, a company known for its advancements in hair styling technology. His role at Jemella Limited has allowed him to focus on developing innovative solutions that cater to the needs of consumers.

Collaborations

Some of his coworkers include Stephen Anthony Sayers and Daniel Brady. Their collaboration has likely contributed to the innovative environment at Jemella Limited.

Conclusion

Jason Palmer's contributions to hair styling technology exemplify the spirit of innovation. His patent for a hair styling device showcases his ability to create practical solutions in the beauty industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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