Niagara Falls, NY, United States of America

Jason Palazzo

This inventor holds 1 USPTO granted patent. Top assignee: Bmp America, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Palazzo. Retrieved from https://idiyas.com/inventor/jason-palazzo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Jason Palazzo: Innovator in Printing Technology

Introduction

Jason Palazzo is an accomplished inventor based in Niagara Falls, NY (US). He has made significant contributions to the field of printing technology, particularly with his innovative approach to release agent delivery systems.

Latest Patents

Palazzo holds a patent for a "Release agent delivery system for use in printer devices." This system utilizes a web that is a non-woven textile comprised of substantially all sub-denier fibers. The design of this release agent delivery system enhances the electrophotographic printing process by creating finer oil flow patterns, which ultimately yield improved print quality and decreased microscopic streaking.

Career Highlights

Palazzo is currently employed at Bmp America, Inc., where he continues to develop and refine technologies that enhance printing processes. His work has been instrumental in advancing the capabilities of printer devices.

Collaborations

Throughout his career, Jason has collaborated with notable colleagues, including Alan R. Lebold and Neil Graham Dugdale. These partnerships have contributed to the innovative solutions he has developed in the printing industry.

Conclusion

Jason Palazzo's contributions to printing technology through his patented innovations demonstrate his commitment to improving print quality and efficiency. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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