Sunnyvale, CA, United States of America

Jason Michael Lamb

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2019-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Michael Lamb. Retrieved from https://idiyas.com/inventor/jason-michael-lamb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Innovations by Jason Michael Lamb

Introduction

Jason Michael Lamb is an accomplished inventor based in Sunnyvale, CA. He has made significant contributions to the field of alignment systems in process chambers. With a total of 2 patents, his work focuses on improving process uniformity in substrate processing.

Latest Patents

Lamb's latest patents include innovative alignment systems that employ actuators to provide relative displacement between lid assemblies of process chambers and substrates. These systems are designed to enhance the positioning of the lid assembly relative to the substrate, thereby improving process uniformity across the substrate within the process chamber. The process chamber is defined by walls that create a process volume where substrates can be placed. The lid assembly is equipped with energy sources and process gas dispensers, which are crucial for various applications.

Career Highlights

Jason Michael Lamb is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in alignment systems has positioned him as a key player in enhancing manufacturing processes.

Collaborations

Lamb has collaborated with notable colleagues, including Juan Carlos Rocha-Alvarez and Jun Tae Choi, to further advance the innovations in his field.

Conclusion

Jason Michael Lamb's contributions to alignment systems in process chambers reflect his dedication to innovation and excellence in technology. His patents are a testament to his expertise and commitment to improving substrate processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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