Penfield, NY, United States of America

Jason Matthew LeFevre

This inventor holds 25 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in 3D Printing Technology. Top assignee: Xerox Corporation. Active years: 2010-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Matthew LeFevre. Retrieved from https://idiyas.com/inventor/jason-matthew-lefevre

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 64.0

 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2010-2025

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Areas of Expertise:
Security Printing
Mixed Spot Sizes
Light Emitting Diodes
Curing Station
Active Transparent Display
Digital Image Registration
Object Packaging
UV Curing
Anti-Contamination Coating
Inkjet Printer
Media Temperature
Continuous Feed Imaging
25 patents (USPTO):Explore Patents

Title: Jason Matthew LeFevre - Innovative Inventor from Penfield, NY

Introduction: Jason Matthew LeFevre is a talented inventor hailing from Penfield, NY, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Jason LeFevre holds several patents in the areas of renewable energy, artificial intelligence, and sustainable technologies, showcasing his commitment to creating a more sustainable future.

Career Highlights: With a background in engineering and a passion for problem-solving, Jason has successfully brought several innovative ideas from concept to reality, revolutionizing industries along the way.

Collaborations: Throughout his career, Jason has collaborated with leading research institutions, universities, and tech companies to further develop his inventions and bring them to market, solidifying his reputation as a forward-thinker in the industry.

Conclusion: Jason Matthew LeFevre's dedication to innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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