Jason M Parry

Title: Jason M Parry: Innovator in Semiconductor Technology

Introduction

Jason M Parry is a notable inventor based in Winooski, Vermont. He has made significant contributions to the field of semiconductor technology, particularly in the area of graphical image formation. His innovative approach has led to the development of a unique method that enhances the resolution of graphical images in semiconductor devices.

Latest Patents

Jason M Parry holds a patent for a method titled "Method for forming graphical images in semiconductor devices." This patent describes a process for creating high-resolution gray scale graphical images in a semiconductor substrate. The method utilizes two or more levels of indicia with a plurality of image segments, incorporating a continuous conductive line on the substrate's surface. Each image segment includes a portion of the conductive line and contrasting material that provides pixels. The width of the line within each segment varies according to the gray scale levels of the graphic image being formed.

Career Highlights

Jason is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in semiconductor technology. His work has been instrumental in advancing the capabilities of graphical image formation, making significant strides in the industry.

Collaborations

Throughout his career, Jason has collaborated with esteemed colleagues such as Phillip L Corson and Gary R Holsopple. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

In summary, Jason M Parry is a distinguished inventor whose work in semiconductor technology has led to innovative methods for forming graphical images. His contributions continue to impact the field, showcasing the importance of creativity and collaboration in technological advancements.