Liverpool, United Kingdom

Jason Lee

This inventor holds 1 USPTO granted patent. Top assignee: University of Illinois. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jason Lee. Retrieved from https://idiyas.com/inventor/jason-lee-vissdwft

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Jason Lee - Innovator in Semiconductor Technology

Introduction

Jason Lee is a prominent inventor based in Liverpool, GB. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for creating ultrathin oxide films.

Latest Patents

Jason Lee holds a patent for a method of making a semiconductor structure. This method involves contacting a surface of a semiconductor with a liquid containing Zr (OPr) to form a modified surface. The process includes activating the modified surface and repeating the contacting and activating steps to create a layer of zirconia on the semiconductor surface. He has 1 patent to his name.

Career Highlights

Lee is affiliated with the University of Illinois, where he continues to advance research in semiconductor technologies. His work has implications for various applications in electronics and materials science.

Collaborations

Jason has collaborated with notable colleagues, including Walter G. Klemperer and Erik A. Mikalsen, enhancing the impact of his research through teamwork and shared expertise.

Conclusion

Jason Lee's innovative work in semiconductor technology exemplifies the importance of research and development in advancing modern electronics. His contributions are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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