Jason Chang

Title: Jason Chang - Innovator in Semiconductor Technology

Introduction

Jason Chang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for semiconductor selective etching and BSI image sensors. His innovative approach has garnered attention in the industry.

Latest Patents

Jason Chang holds a patent for a "Method for semiconductor selective etching and BSI image sensor." This patent describes a method of selectively etching a semiconductor device and manufacturing a BSI image sensor device. The process involves etching a doped silicon substrate with an HNA solution for a predetermined time duration to obtain an etching solution with a concentration of nitrite ions. The etching of the semiconductor device requires an initial concentration of nitride ions that is lower than the final concentration. The HNA solution comprises hydrofluoric acid (HF), nitric acid (HNO), and acetic acid (CHCOOH). The resulting BSI image sensor device achieves a uniform thickness when etched using the obtained etching solution. Jason Chang has 1 patent to his name.

Career Highlights

Throughout his career, Jason has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation and Shanghai One Top Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Jason has collaborated with several professionals in his field, including Simon Wang and Phil Wu. These collaborations have further enhanced his work and innovation in semiconductor technology.

Conclusion

Jason Chang is a key figure in the semiconductor industry, known for his innovative methods and contributions. His patent on semiconductor selective etching and BSI image sensors showcases his expertise and commitment to advancing technology.