Central, SC, United States of America

Jason B Reppert


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations of Jason B Reppert

Introduction

Jason B Reppert is an accomplished inventor based in Central, SC (US). He has made significant contributions to the field of substrate patterning through his innovative methods and devices. His work focuses on utilizing field emitted electrons to create micro- and nano-sized patterns on substrates, which has implications for various technological advancements.

Latest Patents

Jason B Reppert holds a patent for "Substrate patterning by electron emission-induced displacement." This patent discloses methods and devices for patterning micro- and/or nano-sized pattern elements on a substrate using field emitted electrons from an element. The disclosed methods can also form nano- and micron-sized depressions in a substrate more economically than previous methods. The techniques include single-step methods that allow for the simultaneous creation and precise location of structures on a substrate. By applying a bias voltage between a probe tip and a substrate held at a close gap distance, current flow can be promoted via field emissions. During a voltage pulse, and within predetermined energy levels and tip-to-surface gap distances, three-dimensional formations can be developed on the substrate surface.

Career Highlights

Jason B Reppert is affiliated with Clemson University, where he continues to advance his research and innovation in substrate patterning. His work has garnered attention for its potential applications in various industries, including electronics and materials science.

Collaborations

Jason has collaborated with notable colleagues such as Jay B Gaillard and Bevan Craig Elliott, contributing to a dynamic research environment that fosters innovation and development.

Conclusion

In summary, Jason B Reppert is a pioneering inventor whose work in substrate patterning has the potential to revolutionize the way micro- and nano-sized patterns are created. His contributions to the field are significant and continue to inspire advancements in technology.

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