Oulu, Finland

Jari Yrjäna Hulkkonen

This inventor holds 1 USPTO granted patent. Top assignee: Nokia Technologies Oy. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jari Yrjäna Hulkkonen. Retrieved from https://idiyas.com/inventor/jari-yrjäna-hulkkonen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jari Yrjäna Hulkkonen: Innovator in Beam Management Technology

Introduction

Jari Yrjäna Hulkkonen is a notable inventor based in Oulu, Finland. He has made significant contributions to the field of telecommunications, particularly in beam management technology. His innovative approach has led to the development of a patent that enhances signal transmission and reception.

Latest Patents

Hulkkonen holds a patent for an apparatus that includes means for determining a set of beams for transmitting and/or receiving signals in a first frequency range. The invention also involves mapping at least one beam from this set to a second, different frequency range. This technology facilitates the transmission and reception of signals in varying frequency ranges, showcasing Hulkkonen's expertise in the field.

Career Highlights

Jari Yrjäna Hulkkonen is currently employed at Nokia Technologies Oy, a leading company in telecommunications. His work at Nokia has allowed him to collaborate with other talented professionals in the industry, further advancing his career and contributions to technology.

Collaborations

Some of his notable coworkers include Jukka Olavi Talvitie and Sami-Jukka Hakola. Their collaboration has likely contributed to the innovative projects at Nokia Technologies Oy.

Conclusion

Jari Yrjäna Hulkkonen is a distinguished inventor whose work in beam management technology has made a significant impact in telecommunications. His patent reflects his innovative spirit and dedication to advancing technology in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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