This inventor holds 1 USPTO granted patent. Top assignees: Wojskowa Akademia Techniczna, Zaklady Kineskopowe 'Unitra-Polkolor' Zaklady Kineskopow Kolorowych. Active years: 1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989
Title: Janusz Parka: Innovator in Liquid Crystalline Compositions
Introduction
Janusz Parka is a notable inventor based in Warsaw, Poland. He has made significant contributions to the field of liquid crystalline materials, particularly through his innovative patent on liquid crystalline ethane derivatives. His work has implications for various applications, including display technologies.
Latest Patents
Janusz Parka holds a patent for "Liquid crystalline ethane derivatives, their preparation and the liquid." This patent describes a method for creating liquid crystalline compositions that utilize known liquid crystalline compounds. The compounds have a general formula that includes various substituted rings and alkyl chains, which contribute to their unique properties. These compositions are characterized by low viscosity, making them suitable for use in displays.
Career Highlights
Throughout his career, Janusz Parka has worked with several esteemed organizations. He has been associated with the Military University of Technology and Zakłady Kineskopowe 'Unitra-Polkolor', where he has contributed to advancements in liquid crystal technology. His expertise in this area has positioned him as a key figure in the development of innovative materials.
Collaborations
Janusz Parka has collaborated with notable colleagues, including Roman Slawomir Dabrowski and Jerzy Dziaduszek. These partnerships have fostered a collaborative environment that has enhanced the research and development of liquid crystalline technologies.
Conclusion
Janusz Parka's contributions to the field of liquid crystalline compositions highlight his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his significant impact on the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile