Veldhoven, Netherlands

Janne Maria Brok


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Janne Maria Brok

Introduction:

Janne Maria Brok, a brilliant inventor based in Veldhoven, Netherlands, has made significant contributions to the field of lithographic process measurement. With one patent to his name, Janne Maria Brok's work has paved the way for advancements in the accuracy and efficiency of measuring structures on substrates.

Latest Patents:

Janne Maria Brok's patent, titled "Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods and apparatus," focuses on a reconstruction process that involves measuring structures formed on a substrate, determining reconstruction models, and minimizing errors induced by nuisance parameters. His innovative approach includes incorporating statistical descriptions of nuisance parameters' behavior to enhance reconstruction accuracy.

Career Highlights:

Currently employed at ASML Netherlands B.V., Janne Maria Brok continues to push the boundaries of innovation in the field of lithography. His expertise in developing cutting-edge measurement techniques has earned him recognition as a key player in the industry. Brok's dedication to precision and problem-solving exemplifies his commitment to driving technological advancements forward.

Collaborations:

In his professional journey, Janne Maria Brok has collaborated with esteemed colleagues such as Martijn Peter Mink and Irwan Dani Setija. Through these collaborations, Brok has been able to synergize his innovative ideas with the expertise of his peers, leading to groundbreaking developments in the measurement and reconstruction processes within the lithography sector.

Conclusion:

Janne Maria Brok's inventive spirit and commitment to excellence shine through in his pioneering work in lithographic process measurement. His patent stands as a testament to his ingenuity and dedication to advancing technology in the field. As Janne Maria Brok continues to innovate and collaborate with industry leaders, the future of lithography looks brighter than ever.

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