Battaramulla, Sri Lanka

Janmi Perera

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Mas Innovation Limited. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Janmi Perera. Retrieved from https://idiyas.com/inventor/janmi-perera

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Janmi Perera: Innovator in Knitted Structures

Introduction

Janmi Perera is a notable inventor based in Battaramulla, Sri Lanka. He has made significant contributions to the field of textile engineering, particularly through his innovative designs in knitted structures.

Latest Patents

Janmi holds a patent for a "Knitted structure for an actuation element." This invention relates to a knitted structure that comprises an elastic fabric layer and an inelastic fabric layer. The elastic fabric layer is knitted with the inelastic fabric layer along their respective joint edges. A channel is formed between these layers, which is configured to receive the actuation element. Upon actuation, the elastic fabric layer is stretched while the inelastic fabric layer remains undeformed.

Career Highlights

Throughout his career, Janmi has worked with various companies, including Mas Innovation (Private) Limited and Mas Innovation Limited. His work has focused on developing innovative textile solutions that enhance functionality and performance.

Collaborations

Janmi has collaborated with several professionals in his field, including Angelo Karunaratne and Hetti Arachchige Malaka Chathuranga Perera.

Conclusion

Janmi Perera's contributions to the field of knitted structures demonstrate his innovative spirit and commitment to advancing textile technology. His patent reflects a unique approach to integrating functionality with design, marking him as a significant figure in his industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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