Suwon, South Korea

Jangho Lee

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jangho Lee. Retrieved from https://idiyas.com/inventor/jangho-lee-teoh42je

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jangho Lee: Semiconductor Device Inventor

Introduction

Jangho Lee is an inventor based in Suwon, South Korea, and is associated with Samsung Electronics Co., Ltd. His work includes a patent for semiconductor-device manufacturing.

Latest Patents

Lee is credited with 1 patent: “Semiconductor Device and Method of Manufacturing the Same.” The patent describes a manufacturing method that forms an opening in a mask layer to expose a cut region of gate lines, creates a separation hole by removing part of a gate capping layer, and uses a pyrolysis material pattern during processing. After that pattern is decomposed and removed, an etch stop layer is formed along the separation hole. The method then uses the etch stop layer to remove an exposed portion of the gate electrode.

Career Highlights

Lee’s listed patent concerns semiconductor fabrication, particularly the processing and separation of gate structures. The work is associated with Samsung Electronics Co., Ltd.

Collaborations

Seungheon Lee and Donghyun Roh are identified as Lee’s coworkers. The available information does not specify their roles in the patent or whether they collaborated on it.

Conclusion

Jangho Lee’s recorded patent focuses on a method for manufacturing semiconductor devices and processing gate structures.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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