Company Filing History:
Years Active: 2006
Title: The Innovations of Jang Syun Ming in Semiconductor Technology
Introduction
Jang Syun Ming is a notable inventor based in Hsin-Chu, Taiwan, recognized for his contributions to semiconductor technology. His innovative work focuses on improving manufacturing processes in the semiconductor industry. With a strong emphasis on problem-solving and advancing technology, Jang has successfully patented a significant method that enhances the quality and reliability of semiconductor devices.
Latest Patents
Jang Syun Ming holds one patent that addresses the challenges of oxide thickness variations during shallow trench isolation (STI) processes. The patent, titled "Shallow trench isolation method for reducing oxide thickness variations at different pattern densities," presents a sophisticated technique using multiple deposition and etching steps to achieve a smoother dielectric layer surface. This innovative approach significantly enhances the reliability of STI features while minimizing dishing in wide trenches, ensuring better performance in semiconductor applications.
Career Highlights
Currently, Jang is employed at Taiwan Semiconductor Manufacturing Company Limited, one of the leading firms in the semiconductor industry. His expertise in semiconductor processes has positioned him as a valuable asset in the pursuit of cutting-edge technology solutions. His work has led to improved manufacturing methods that have a lasting impact on the production of high-performance semiconductor devices.
Collaborations
Throughout his career, Jang has collaborated with esteemed coworkers, including Chih-Cheng Lu and Chuan-Ping Hou. These partnerships have fostered an environment of innovation and shared knowledge, contributing to advancements in semiconductor technologies. Together, they have pushed the boundaries of what is possible in the industry, ensuring that their contributions remain integral to the success of their projects.
Conclusion
Jang Syun Ming's dedication to innovation and excellence has earned him recognition in the semiconductor industry. His patented method for reducing oxide thickness variations represents a significant leap forward in semiconductor manufacturing processes. As technology continues to evolve, Jang's work will undoubtedly inspire future innovations, shaping the landscape of semiconductor technology for years to come.