Company Filing History:
Years Active: 2025
Title: Jang Hee Lee: Innovator in Substrate Treatment Technology
Introduction
Jang Hee Lee is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus and method that enhances the efficiency of substrate processing.
Latest Patents
Jang Hee Lee holds 1 patent for his invention titled "Apparatus and method for treating substrate." This patent describes a substrate treating apparatus that includes a process chamber with a reaction space. The apparatus features insulation members, a substrate support member, a gas supply member, a plasma source, and a controller. The controller manages the gas supply and plasma generation to optimize the treatment process for substrates.
Career Highlights
Jang Hee Lee is currently employed at Semes Co., Ltd., where he continues to innovate in substrate treatment technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment. He has demonstrated a commitment to improving the efficiency and effectiveness of these technologies.
Collaborations
Jang Hee Lee collaborates with talented colleagues, including Jin Woo Choi and Seung Jun Oh. Their combined expertise contributes to the development of cutting-edge solutions in the field of substrate treatment.
Conclusion
Jang Hee Lee's contributions to substrate treatment technology exemplify the impact of innovative thinking in engineering. His patent and ongoing work at Semes Co., Ltd. highlight his role as a key player in advancing this important field.