The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Dec. 29, 2021
Semes Co., Ltd., Chungcheongnam-do, KR;
Jin Woo Choi, Gyeonggi-do, KR;
Seung Jun Oh, Gyeonggi-do, KR;
Jin Woo Nam, Chungcheongbuk-do, KR;
Jang Hee Lee, Gyeonggi-do, KR;
Young Hak Park, Chungcheongnam-do, KR;
Ahn Na Seo, Chungcheongnam-do, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
A substrate treating apparatus includes a process chamber having a reaction space with one or more insulation members exposed to the reaction space; a substrate support member supporting a substrate at the reaction space; a gas supply member selectively supplying a passivation gas and a process gas to the reaction space; a plasma source exciting a gas into a plasma; and a controller which controls the gas supply member and the plasma source, and after a substrate to be treated is taken into the reaction space and supported by the support member, the controller controls the gas supply member and the plasma source to supply the passivation gas and the process gas to the reaction space simultaneously or sequentially, and generate a plasma in the reaction space under the condition of stopping a supply of the passivation gas but supplying the process gas.