Company Filing History:
Years Active: 2002-2004
Title: Jürgen Knobloch: Innovator in Photolithography
Introduction
Jürgen Knobloch is a notable inventor based in München, Germany. He has made significant contributions to the field of photolithography, particularly in the fabrication of microstructures. With a total of 3 patents to his name, his work has had a considerable impact on the technology used in dynamic random access memory (DRAM) production.
Latest Patents
One of Jürgen Knobloch's latest patents is a method of fabricating a microstructure and photolithography trimming mask. This innovative photolithographic fabrication method allows for the creation of microstructures on a substrate, specifically interconnects of DRAM. The process includes a first exposure using at least one alternating phase mask, followed by a postexposure with a trimming mask that features multiple trimming openings. This technique enables the arrangement of microstructures in a space-saving manner on the substrate.
Another significant patent is the method for producing an alternating phase mask. In this process, a carrier with a mask layer undergoes exposure and development to create a first exposure structure. This structure serves as an etching mask for the mask layer, which is then etched. A second irradiation-sensitive layer is applied, exposed, and developed to form a second exposure structure with varying thicknesses. The etching process is carried out to different depths based on these thicknesses, allowing for precise control in the fabrication of microstructures.
Career Highlights
Throughout his career, Jürgen Knobloch has worked with prominent companies in the technology sector. He has been associated with Infineon Technologies AG and Siemens Aktiengesellschaft, where he has contributed to advancements in semiconductor technology. His expertise in photolithography has positioned him as a key player in the development of innovative manufacturing processes.
Collaborations
Jürgen has collaborated with notable colleagues, including Rainer Pforr and Christoph Friedrich. These partnerships have fostered a collaborative environment that has led to the advancement of technologies in the field of microfabrication.
Conclusion
Jürgen Knobloch's contributions to photolithography and microstructure fabrication have established him as a significant inventor in the technology sector. His innovative methods and collaborations continue to influence advancements in semiconductor manufacturing.