This inventor holds 2 USPTO granted patents. Top assignee: Other. Active years: 2001-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2003
Title: Jörg Talbiersky: Innovator in Chemical Processes
Introduction
Jörg Talbiersky is a notable inventor based in Dorsten, Germany. He has made significant contributions to the field of chemistry, particularly in the production of aryl alkyl ethers and the removal of metal ions from cresol mixtures. With a total of 2 patents, his work showcases innovative methods that enhance chemical processes.
Latest Patents
Talbiersky's latest patents include a method for the production of aryl alkyl ethers. This method involves the reaction of hydroxyaromatics with an alcohol in the presence of a catalyst. The process achieves higher yields of aryl alkyl ethers while markedly reducing the formation of ring-alkylated products and dialkyl ethers. Another significant patent is for a method of removing metal ions from cresol mixtures. This method adjusts the water content in the cresol mixture to at least about 0.5 percent by weight through the addition of water. The resulting water-and-cresol mixture is then passed over an acid ion exchanger, achieving a metal ion content of less than 20 ppb per metal ion.
Career Highlights
Throughout his career, Jörg Talbiersky has focused on developing efficient chemical processes that address industry challenges. His innovative approaches have led to advancements in the production and purification of chemical compounds.
Collaborations
Talbiersky has worked alongside notable colleagues such as Edgar Fuhrmann and Heinz Günter Janneck. Their collaborative efforts have contributed to the success of various projects in the field of chemistry.
Conclusion
Jörg Talbiersky's contributions to chemical processes through his patents demonstrate his commitment to innovation in the field. His work not only enhances production methods but also addresses environmental concerns related to chemical manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile