Sigtuna, Sweden

Jöns G Hilborn

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jöns G Hilborn. Retrieved from https://idiyas.com/inventor/jandoumlns-g-hilborn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Jöns G Hilborn: Innovator in Silicone Elastomer Technology

Introduction

Jöns G Hilborn is a notable inventor based in Sigtuna, Sweden. He has made significant contributions to the field of materials science, particularly in the development of silicone elastomer stamps. His innovative approach has opened new avenues for printing technologies.

Latest Patents

Hilborn holds a patent for a "Silicone elastomer stamp with hydrophilic surfaces and method of making same." This patent describes a method for fabricating silicone elastomer stamps with hydrophilic surfaces using the concept of polymer grafting. The resulting stamps possess the unique advantage of being permanently hydrophilic, allowing for the reproducible printing of aqueous or highly polar inks over extended periods.

Career Highlights

Jöns G Hilborn is associated with International Business Machines Corporation (IBM), where he has applied his expertise in materials science. His work has contributed to advancements in printing technologies and materials engineering.

Collaborations

Hilborn has collaborated with notable colleagues, including Andre Bernard and Emmanuel Delamarche. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Jöns G Hilborn's contributions to silicone elastomer technology exemplify the impact of innovative thinking in materials science. His work continues to influence the development of advanced printing techniques and applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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