US

Jan Zarsky

This inventor holds 0 USPTO granted patents, plus 5 CIPO patents.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Zarsky. Retrieved from https://idiyas.com/inventor/jan-zarsky-e3thp9dt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

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Title: Jan Zarsky: Innovator in Subcutaneous Treatment Technologies

Introduction

Jan Zarsky is an inventive mind based in the United States, known for his contributions to the field of medical technology. He has developed innovative methods for subcutaneous treatments, focusing on body contouring and skin tightening. His work emphasizes the use of controlled heating to achieve desired effects in targeted areas of the body.

Latest Patents

Jan Zarsky holds a patent for "Methods And Systems For Subcutaneous Treatments." This patent outlines methods for focused remodeling and downsizing the volume of subcutaneous lipid-rich cells. The technology involves the application of electromagnetic energy to heat subcutaneous tissues, which facilitates body contouring and skin tightening. The applicator used in this process does not touch the skin, and a spacer made of insulating or dielectric material may be employed between the applicator and the skin.

Career Highlights

Throughout his career, Jan Zarsky has made significant strides in the medical technology sector. His innovative approaches have garnered attention and recognition within the industry. Despite having no patents listed under his name, his contributions to the field are noteworthy.

Collaborations

Jan Zarsky has worked with several companies, including Medical Technologies CZ and BTL Holdings Limited. These collaborations have allowed him to further develop and refine his innovative technologies in the medical field.

Conclusion

Jan Zarsky is a prominent figure in the realm of subcutaneous treatment technologies. His innovative methods and dedication to advancing medical technology continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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