Jan Verweel

Title: Innovations of Jan Verweel in Magnetic Quadrupole Technology

Introduction

Jan Verweel is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of magnetic quadrupole technology, holding a total of 5 patents. His work primarily focuses on devices that enhance manufacturing processes in various applications, including color display tubes.

Latest Patents

Verweel's latest patents include innovative methods for manufacturing a magnetic quadrupole post-focusing mask. In one method, he describes a meander-shaped coil positioned on each side of the mask, which has apertures. When a current flows through these coils in the correct direction, a magnetic quadrupole is formed around each aperture. Another method involves using a holder with permanent magnetic strips on either side of the mask. The strips in one holder are oriented perpendicularly to those in the other holder. A coil is then used to generate a decaying magnetic alternating field, which drives the material of the mask into saturation. After the decay of this field, a magnetic quadrupole is established around each aperture.

Career Highlights

Jan Verweel is associated with U.S. Philips Corporation, where he has been instrumental in advancing technologies related to magnetic quadrupoles. His innovative approaches have paved the way for improvements in manufacturing processes, particularly in the production of color display tubes.

Collaborations

Throughout his career, Verweel has collaborated with esteemed colleagues such as Hinne Zijlstra and Willem M Van Alphen. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in his field.

Conclusion

Jan Verweel's contributions to magnetic quadrupole technology exemplify the impact of innovative thinking in engineering and manufacturing. His patents reflect a commitment to advancing technology and improving production methods.