The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 1977
Filed:
Mar. 22, 1977
Applicant:
Inventors:
Willem Meijndert VAN Alphen, Eindhoven, NL;
Jan Verweel, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
313403 ; 315375 ;
Abstract
A post-focusing type color cathode ray tube comprising a quadrupole lens formed in each aperture of the color selection mask.
VAN Alphen, Willem. (1977). Shadow mask each aperture of which is defined by a quadrupolar lens (U.S. Patent No. 4059781). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4059781
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile