Allerød, Denmark

Jan Pietraszek

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Amminex Emissions Technology A/s. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Pietraszek. Retrieved from https://idiyas.com/inventor/jan-pietraszek

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Jan Pietraszek: Innovator in Gas Dosing Technology

Introduction

Jan Pietraszek is a notable inventor based in Allerod, Denmark. He has made significant contributions to the field of gas dosing technology. His innovative approach addresses challenges associated with fluctuating supply pressure in gas dosing systems.

Latest Patents

Jan Pietraszek holds a patent for a "Method and device for controlled dosing of a gas with fluctuating supply pressure." This invention outlines a method for controlled dosing of gas through a valve while managing the pressure within a control volume. The process involves recording the decrease in control-volume pressure and adjusting the dosing based on the known volume and changes in pressure and temperature. This method enhances the accuracy and efficiency of gas dosing, making it a valuable advancement in the industry.

Career Highlights

Jan Pietraszek is currently employed at Amminex Emissions Technology A/S, where he continues to develop innovative solutions in emissions technology. His work focuses on improving gas dosing systems, which are crucial for various applications in the industry.

Collaborations

Jan collaborates with his coworker, Tue Johannessen, to further enhance their research and development efforts in gas dosing technology.

Conclusion

Jan Pietraszek's contributions to gas dosing technology demonstrate his commitment to innovation and efficiency. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving industrial processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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