Jan Pieter Roelof Jongeneel

Title: Jan Pieter Roelof Jongeneel: Innovating Lithography Systems

Introduction: Jan Pieter Roelof Jongeneel is a distinguished inventor based in Delft, Netherlands, recognized for his contributions to the field of lithography. With one patent to his name, he has made notable advancements in the transfer of substrates within lithographic systems.

Latest Patents: Jongeneel holds a patent for a "Load lock system and method for transferring substrates in a lithography system." This invention focuses on an apparatus designed for the efficient transfer of substrates into and out of a vacuum chamber in a lithography setup. The load lock system features a specialized chamber with an opening for substrate passage and an innovative transfer apparatus, which includes a hinged arm mechanism designed to facilitate smooth operations.

Career Highlights: His professional journey has been significantly linked with Mapper Lithography IP B.V., a company dedicated to advancing lithography technology. Jongeneel's expertise and innovative approach have established him as a valuable asset in the field of patentable inventions related to lithography.

Collaborations: Throughout his career, Jongeneel has worked alongside esteemed colleagues such as Michel Pieter Dansberg and Sjoerd Hesdahl. Their collaborative efforts have contributed to the growth and development of cutting-edge lithographic technologies.

Conclusion: Jan Pieter Roelof Jongeneel's contributions to lithography through his inventive work and collaborations underscore the importance of innovation in technology. His patent on the load lock system exemplifies a significant advancement in the efficient handling of substrates, marking him as an influential figure in the industry.