Ballenstedt, Germany

Jan Michalk

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Contitech Deutschland Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan Michalk. Retrieved from https://idiyas.com/inventor/jan-michalk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jan Michalk: Inventor of a High-Performance EPDM Toothed Belt

Introduction

Jan Michalk is an inventor associated with Ballenstedt, Germany, and ContiTech Deutschland GmbH. His patent work addresses the durability and low-temperature performance of elastomer toothed belts.

Latest Patents

Michalk is associated with 1 patent, titled “High-performance toothed belt made of EPDM.” The invention describes an elastomer toothed belt with teeth made primarily from crosslinked EPM and/or EPDM rubber. An interlayer containing predominantly hydrogenated acrylonitrile-butadiene rubber (HNBR) sits between the belt’s fabric and its teeth.

The patent presents this construction as a halogen-free approach intended to improve belt durability, low-temperature stability, and adhesion between the teeth and fabric. It also describes manufacturing processes and the use of an HNBR layer to support these performance benefits.

Career Highlights

Michalk’s listed company affiliation is ContiTech Deutschland GmbH. His patent reflects work on material composition and belt construction for improved service life and performance under low-temperature conditions.

Collaborations

Heiko Sattler and Henning Kanzow are identified as Michalk’s coworkers. The available information does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Jan Michalk’s patent focuses on an EPDM-based toothed belt designed to combine halogen-free materials with improved durability, low-temperature stability, and fabric-tooth adhesion.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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