Florence, AL, United States of America

Jan M Pottinger

This inventor holds 1 USPTO granted patent. Top assignee: Reynolds Metals Company. Active years: 1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan M Pottinger. Retrieved from https://idiyas.com/inventor/jan-m-pottinger

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Jan M Pottinger: Innovator in Refractory Surfaces

Introduction

Jan M Pottinger is a notable inventor based in Florence, AL (US). She has made significant contributions to the field of materials science, particularly in the development of refractory surfaces for alumina reduction cell cathodes. Her innovative work has led to the granting of a patent, showcasing her expertise and dedication to advancing technology.

Latest Patents

Jan M Pottinger holds a patent for "Refractory surfaces for alumina reduction cell cathodes and methods for." This patent highlights her innovative approach to improving the efficiency and effectiveness of alumina reduction processes. The patent is a testament to her skills and knowledge in the field.

Career Highlights

Jan is currently employed at Reynolds Metals Company, where she continues to apply her expertise in materials science. Her role at the company allows her to work on cutting-edge projects that contribute to advancements in the industry.

Collaborations

Throughout her career, Jan has collaborated with esteemed colleagues such as Howard I Kaplan and Jerry H Bryce. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Jan M Pottinger is a remarkable inventor whose work in refractory surfaces has made a significant impact in her field. Her contributions continue to influence advancements in alumina reduction technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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