This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Jan M Chabala: Innovator in Lithography Technology
Introduction
Jan M Chabala is a notable inventor based in San Ramon, CA (US). He has made significant contributions to the field of lithography, particularly through his innovative patent that enhances the efficiency of scanning lithography tools. His work is instrumental in advancing the technology used in various applications.
Latest Patents
Jan M Chabala holds a patent titled "Lithography using multiple pass raster-shaped beam." This patent describes a scanning lithography tool that exposes a medium in a raster scan. The process involves a multi-pass scan where the shape of the beam is altered between passes. Certain pixels are exposed using a Gaussian (round) beam, while others are exposed with a shaped beam, such as square or rectangular. This innovative approach significantly reduces edge blur, a common issue in raster scan lithography. The method is applicable to both electron beam and laser beam raster scanning lithography.
Career Highlights
Jan M Chabala is associated with Applied Materials, Inc., a leading company in the field of materials engineering. His expertise and innovative mindset have contributed to the company's advancements in lithography technology.
Collaborations
Jan has worked alongside Fayez E Abboud, collaborating on various projects that aim to push the boundaries of lithography and its applications.
Conclusion
Jan M Chabala's contributions to lithography technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the industry and pave the way for future innovations.