Jan Lazar

Title: Jan Lazar - Innovator in Reactive Sputtering Technology

Introduction

Jan Lazar is a notable inventor from Malenice, Poland, recognized for his contributions to the field of reactive sputtering technology. He holds a patent that showcases his innovative approach to controlling reactive sputter deposition processes. His work has significant implications for the production of dielectric stoichiometric films, which are essential in various technological applications.

Latest Patents

Jan Lazar's patent, titled "High-rate reactive sputtering of dielectric stoichiometric films," presents a method for controlling a reactive sputter deposition process. This method involves selecting control process parameters for a target material and a reactive gas. The process is designed to form a compound through a reaction between the target material and reactive gas species in a vacuum chamber. By establishing an operation regime for the deposition process, Lazar's method achieves stabilized reactive deposition of the compound on a substrate, resulting in a dielectric stoichiometric film. He holds 1 patent in this area.

Career Highlights

Throughout his career, Jan Lazar has worked with esteemed institutions, including the University of West Bohemia in Pilsen and Trumpf Huettinger Sp. z o.o. His experience in these organizations has allowed him to refine his expertise in sputtering technology and contribute to advancements in the field.

Collaborations

Jan Lazar has collaborated with notable colleagues, including Rafal Bugyi and Jaroslav Vlcek. Their combined efforts have furthered research and development in reactive sputtering processes.

Conclusion

Jan Lazar's innovative work in reactive sputtering technology has made a significant impact on the field. His patent and collaborations highlight his dedication to advancing the science of dielectric films.