Jan H Van Heuvelen

Title: Inventor Spotlight: Jan H Van Heuvelen

Introduction

Jan H Van Heuvelen, a prolific inventor based in Losser, Netherlands, has made significant contributions to the field of thermoplastically processible photosensitive layers. With a portfolio of three patents, Van Heuvelen's innovations primarily focus on seamless and efficient joining techniques that enhance the quality of photosensitive products.

Latest Patents

Van Heuvelen's latest patents showcase his expertise in advanced manufacturing techniques. One notable patent addresses the seamless and firm joining of the end and/or lateral areas of solvent-free and unsupported thermoplastically processible photosensitive layers. His innovative method involves overlapping these areas to avoid bubble formation while displacing air, heating the material under pressure, and achieving a continuous joined photosensitive layer that is then smoothed and shaped to exact dimensions.

Another significant patent describes the coating process for printing cylinders or sleeves. This invention allows for the application of a seamless, smooth photosensitive layer by layering thin, prefabricated, solvent-free, thermoplastically processible materials. The air is displaced between the strata during application, and subsequent heating under pressure fuses the layers, resulting in a perfectly cylindrical and smooth photosensitive layer.

Career Highlights

Jan H Van Heuvelen has built a robust career in the field, having worked with leading companies such as BASF Aktiengesellschaft and Twentse Graveerindustrie B.V. His experience in these organizations has allowed him to refine his skills in material science and manufacturing processes, contributing to his success as an inventor.

Collaborations

Throughout his career, Van Heuvelen has collaborated with esteemed colleagues, including Guenter Wallbillitch and Guenter Wallbillich. These collaborations have expanded his innovative capabilities and led to the development of cutting-edge solutions in the photosensitive layer technology sector.

Conclusion

Jan H Van Heuvelen’s contributions to the field of photosensitive layers are significant, and his innovative patents demonstrate a commitment to enhancing manufacturing processes. As he continues to push the boundaries of technology, his work remains essential to advancements in the industry, inspiring future generations of inventors and researchers.