Jan Dirk Broer

Title: Jan Dirk Broer: Innovator in Polymer Technology

Introduction

Jan Dirk Broer is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of polymer technology, particularly through his innovative approaches to creating polymeric relief structures. His work is characterized by a focus on photo-embossing processes that enhance the capabilities of polymer materials.

Latest Patents

Jan Dirk Broer holds a patent for a "Process for preparing a polymeric relief structure." This invention involves a photo-embossing process that includes several key steps. First, a substrate is coated with a composition that contains radiation-sensitive ingredients and a limited amount of polymeric binder material. Next, the coated substrate is treated with electromagnetic radiation to form a latent image, all while maintaining a temperature below the transition temperature of the coating composition. Finally, the polymerization and/or crosslinking of the coated substrate occurs at a higher temperature, allowing for the creation of a durable polymeric relief structure.

Career Highlights

Broer is associated with the Stichting Dutch Polymer Institute, where he has been instrumental in advancing research and development in polymer science. His expertise in the field has led to innovative solutions that address various challenges in polymer applications.

Collaborations

Throughout his career, Jan Dirk Broer has collaborated with esteemed colleagues, including Ko Hermans and Itsuro Tomatsu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in polymer technology.

Conclusion

Jan Dirk Broer is a prominent figure in the field of polymer technology, with a focus on innovative processes for creating polymeric relief structures. His contributions through patents and collaborations continue to influence the industry and pave the way for future advancements.