Jan Arnaud Janssens

Title: Jan Arnaud Janssens: Innovator in Laser Deposition Technology

Introduction

Jan Arnaud Janssens is a notable inventor based in Schalkhaar, Netherlands. He has made significant contributions to the field of laser deposition technology, holding a total of 2 patents. His work focuses on methods that enhance the efficiency and effectiveness of laser deposition processes.

Latest Patents

One of Janssens' latest patents is a "Method for controlling stress in a substrate during laser deposition." This invention outlines a comprehensive method that includes providing a laser deposition device with a chamber, target holder, substrate holder, and a laser beam directed through a window onto a target. The method allows for the deposition of target material onto various surface portions of the substrate while adjusting parameters such as temperature, pressure, and laser beam power based on the specific surface portion being targeted.

Another significant patent is the "Filter for a plasma plume." This invention features a housing with pass-through openings that form a channel for the plasma plume. It includes a primary blade that rotates around a rotation axis, intersecting with the pass-through channel, and has a contact surface for interaction with the plasma plume. This design aims to improve the efficiency of pulsed laser deposition devices.

Career Highlights

Jan Arnaud Janssens is currently associated with Lam Research Corporation, where he continues to innovate in the field of laser technology. His work has been instrumental in advancing the capabilities of laser deposition techniques, making them more precise and adaptable to various applications.

Collaborations

Throughout his career, Janssens has collaborated with notable colleagues, including Jan Matthijn Dekkers and Willem Cornelis Lambert Hopman. These collaborations have contributed to the development of innovative solutions in laser deposition technology.

Conclusion

Jan Arnaud Janssens is a prominent figure in the field of laser deposition, with a focus on improving substrate stress control and plasma plume filtration. His contributions through patents and collaborations highlight his commitment to advancing technology in this area.